As semiconductor scaling trend continues, directed self-assembly (DSA) provides an inspiring guiding principle and vision for nanofabrication and device integration. Previous research has made a tremendous progress in applying DSA for fabricating periodic and uniform nanostructures over large area. In this talk I will talk about the aperiodic DSA patterns which is critical for device fabrication. First I will demonstrate the flexible control of aperiodic DSA patterns and the application towards next generation lithography. Then I will demonstrate the first 7 nm contact patterning using DSA and a systematic design strategy that links technology node requirements to DSA process and materials. Sub-DSA Resolution Assist Features are also introduced as an effective solution to reduce DSA defectivity. In the last part I will talk about the future of DSA for novel device fabrication.
He (Linda) Yi is a Ph.D. candidate at Stanford University, where she did research on directed self-assembly as the next-generation nanofabrication technology with Prof. H.-S. Philip Wong. Prior to her PhD study she received her BS in Physics and dual BS in Statistics from Peking University in China, 2010. Her research draws from the fields of electrical engineering and material sciences and contributes to advances in semiconductor technology. She received the SPIE BACUS Photomask scholarship in 2014, which is awarded every year to only one student in U.S. with exceptional achievements in the field of optical tooling and semiconductor manufacturing technologies.